Titanium disilicide

Titanium disilicide^[1]

Names
IUPAC name Titanium disilicide
Other names Titanium silicide
Identifiers
CAS Number	12039-83-7
3D model (Jmol)	Interactive image
ECHA InfoCard	100.031.719
PubChem	6336889
InChI InChI=1S/2Si.Ti
SMILES [Si]=[Ti]=[Si]
Properties
Chemical formula	TiSi2
Molar mass	104.038 g/mol
Appearance	black orthorhombic crystals
Density	4.02 g/cm^3
Melting point	1,470 °C (2,680 °F; 1,740 K)
Solubility in water	insoluble
Solubility	soluble in HF
Related compounds
Other cations	Zirconium disilicide Hafnium disilicide
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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Infobox references

Titanium disilicide (TiSi₂) is an inorganic chemical compound.

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.

References

1. Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, FL: CRC Press, pp. 4–91, ISBN 0-8493-0594-2